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Sputtering Targets are mainly used in Vacuum Coating Equipments to coat thin film layers by Physical Vapor Deposition (PVD) on a substrate to add new functions or create microscopic connections and functions as Thin Film Transistors (TFT).
The variety of used materials for Sputtering Targets is very brought and depends on the final application, so that they can be made by pure metals but also by very complex alloys.
VTFM manufacture Planar and Rotary Sputtering Targets in wide range of materials using all available and most advanced technologies to guarantee the best performance.
